Document Type	Doctoral Thesis
Author	Hauser, Thilo Michael
URN	etd-12042006-134717
Document Title	Investigation of the diffusion behaviour of aliminium in different semiconductors
Degree	PhD (Physics)
Department	Physics
Supervisor	Advisor Name Title Prof E Friedland Committee Chair
Keywords	electronic circuits aluminum semiconductors diffusion
Date	1999-12-01
Availability	unrestricted
Abstract Please read the abstract in the section 00front of this document © 1999 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. Please cite as follows: Hauser TM, 1999, Investigation of the diffusion behaviour of aluminium in different semiconductors, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd < http://upetd.up.ac.za/thesis/available/etd- 12042006-134717/ > H573/th
Files	Filename       Size       Approximate Download Time (Hours:Minutes:Seconds)     28.8 Modem   56K Modem   ISDN (64 Kb)   ISDN (128 Kb)   Higher-speed Access    00front.pdf 2.45 Mb 00:11:21 00:05:50 00:05:06 00:02:33 00:00:13   01chapter1-4.pdf 2.49 Mb 00:11:31 00:05:55 00:05:11 00:02:35 00:00:13   02chapter5.pdf 6.18 Mb 00:28:35 00:14:42 00:12:51 00:06:25 00:00:32   03chapter6.pdf 4.93 Mb 00:22:48 00:11:43 00:10:15 00:05:07 00:00:26   04chapter7.pdf 4.09 Mb 00:18:55 00:09:43 00:08:30 00:04:15 00:00:21   05chapter8.pdf 4.21 Mb 00:19:30 00:10:01 00:08:46 00:04:23 00:00:22   06back.pdf 2.34 Mb 00:10:50 00:05:34 00:04:52 00:02:26 00:00:12